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2.
Measurement Process Characterization
2.6. Case studies 2.6.2. Check standard for resistivity measurements
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| Explanation of check standard measurements | The process involves the measurement of resistivity (ohm.cm) of individual silicon wafers cut from a single crystal (# 51939). The wafers were doped with phosphorous to give a nominal resistivity of 100 ohm.cm. A single wafer (#137), chosen at random from a batch of 130 wafers, was designated as the check standard for this process. | ||
| Design of data collection and Database |
The measurements were carried out according to an ASTM Test Method
(F84) with NIST probe #2362.
The measurements on the check standard duplicate certification
measurements that were being made, during the same time period, on
individual wafers from crystal #51939. For the check standard there
were:
The K = 25 days cover the time during which the individual wafers were being certified at the National Institute of Standards and Technology. |
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