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Additional Information |
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Dataset Name: |
SiRstv |
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Procedure: |
Analysis of Variance Certification Method & Definitions |
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Data: |
1 Factor 5 Treatments 5 Replicates/Cell 25 Observations 3 Constant Leading Digits Lower Level of Difficulty Observed Data |
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Model: | 6 Parameters (![]() ![]() |
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Measurements of bulk resistivity of silicon wafers were made at NIST with 5 probing instruments on each of 5 days. The wafers were doped with phosphorous by neutron transmutation doping in order to have nominal resistivities of 200 ohm.cm. Each data point is the average of 6 measurements at the center of each wafer. Measurements were carried out with four-point DC probes according to ASTM Standard F84-93, "Standard Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe." | ||||